Photosensitive resin laminate and thermal processing of the same
US8551688B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Apr 21, 2011 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Nov 22, 2031 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M2205/14
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of developing a photocurable printing blank to produce a relief pattern comprising a plurality of relief dots. The photocurable printing blank comprises a backing layer having at least one photocurable layer disposed thereon, a barrier layer disposed on the at least one photocurable layer, and a laser ablatable mask layer disposed on top of the barrier layer. The method includes the steps of (1) imaging the at least one photocurable layer by ablating the laser ablatable mask layer to create the relief pattern on the photocurable printing blank the printing blank to actinic radiation through the barrier layer and mask layer to one or more sources of actinic radiation to selectively crosslink and cure portions of the at least one photocurable layer, wherein the at least one photocurable layer is crosslinked and cured in the portions not covered by the mask layer, thereby creating the relief pattern; (3) developing the printing blank to remove the barrier layer, the laser ablated mask layer and uncured portions of the photocurable layer and reveal the relief pattern. The presence of the barrier layer produces printing dots having desired characteristics. The method can also b…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.