Patent · US Active

Transistor structures and methods of fabrication thereof

US8552422B2 · kind B2 · utility

0Cited by
1References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 2, 2012
Grant dateOct 8, 2013
Priority date
Expiry dateNov 2, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K85/211
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

An electronic device is presented, such as a thin film transistor. The device comprises a patterned electrically-conductive layer associated with an active element of the electronic device. The electrically-conductive layer has a pattern defining an array of spaced-apart electrically conductive regions. This technique allows for increasing an electric current through the device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.