Glyph rendering
US8553032B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 23, 2011 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Apr 30, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T11/40
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Techniques are provided for glyph rendering based on a polygon mesh having vertices located away from a glyph's outline. Skeletonisation may be used to establish polygonal skeletons in the interior region of a glyph and in the outside region of the glyph. Transepts oriented away from the glyph's outline may be generated for nodes on the glyph's outline. A polygon mesh may be generated with vertices constrained to be selected from a set of candidate vertices comprising termination points of transepts, skeleton nodes, and/or points on the glyph's bounding boxes. Implicit forms may be determined from curves or lines representing segments of the glyph's outline, without use of Bézier control points and endpoints. These implicit forms along with tessellation data may be provided to a computing device as glyph rendering data for rendering the glyph at runtime.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.