Deposition system with electrically isolated pallet and anode assemblies
US8557093B2 · kind B2 · utility
23Cited by
7References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2007 |
| Grant date | Oct 15, 2013 |
| Priority date | — |
| Expiry date | Jan 13, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68771
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system for substrate deposition. The system includes a wafer pallet and an anode. The wafer pallet has a bottom and a top. The top of the wafer pallet is configured to hold a substrate wafer. The anode has a substantially fixed position relative to the wafer pallet and is configured to move with the wafer pallet through the deposition chamber. The anode is electrically isolated from the substrate wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.