Patent · US Active

Deposition system with electrically isolated pallet and anode assemblies

US8557093B2 · kind B2 · utility

23Cited by
7References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 22, 2007
Grant dateOct 15, 2013
Priority date
Expiry dateJan 13, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68771
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A system for substrate deposition. The system includes a wafer pallet and an anode. The wafer pallet has a bottom and a top. The top of the wafer pallet is configured to hold a substrate wafer. The anode has a substantially fixed position relative to the wafer pallet and is configured to move with the wafer pallet through the deposition chamber. The anode is electrically isolated from the substrate wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.