Patent · US Active

Method for producing doped quartz glass

US8557171B2 · kind B2 · utility

3Cited by
5References
28Claims
0Family size

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Inventors

Key dates

Filing dateSep 18, 2008
Grant dateOct 15, 2013
Priority date
Expiry dateNov 10, 2029

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C2203/34
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The invention relates to a method allowing cost-effective production of doped quartz glass, particularly laser-active quartz glass, that is improved with regard to the homogeneity of the doping material distribution, in that a suspension is provided comprising SiO2 particles and an initial compound for at least one doping material in an aqueous fluid, the fluid being removed under formation of a doped intermediate product comprising particles of the doping material or particles of the precursor substance or the doping material, and the doped quartz glass is formed by sintering the doped intermediate product, wherein at least part of the particles of the doping material or the particles of the precursor substance of the same is generated in the suspension as a precipitate of a pH-value-controlled precipitation reaction of the initial compound.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.