Methods for designing, fabricating, and predicting shape formations in a material
US8557613B2 · kind B2 · utility
13Cited by
0References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2011 |
| Grant date | Oct 15, 2013 |
| Priority date | — |
| Expiry date | Sep 27, 2031 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2207/056
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for designing, fabricating, and predicting a desired structure in and/or on a host material through defining etch masks and etching the host material is provided. The desired structure can be micro- or nanoscale structures, such as suspended nanowires and corresponding supporting pillars, and can be defined one layer at a time. Arbitrary desired structures can also be defined and obtained through etching. Further, given the desired structure, a starting structure can be predicted where etching of the starting structure yields the desired structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.