Nanostructured organosilicates from thermally curable block copolymers
US8557943B2 · kind B2 · utility
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25Claims
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Key dates
| Filing date | Apr 29, 2011 |
| Grant date | Oct 15, 2013 |
| Priority date | — |
| Expiry date | Sep 7, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2383/04
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.