Methods of fabricating nanoimprint stamp
US8562842B2 · kind B2 · utility
1Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 13, 2011 |
| Grant date | Oct 22, 2013 |
| Priority date | — |
| Expiry date | Nov 30, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0017
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of fabricating a nanoimprint stamp includes forming a resist pattern having a nano size width on a stamp substrate by performing imprint processes repeatedly. In the imprint processes, resist layers that are selectively etched are sequentially used. The stamp substrate is etched using the resist pattern as an etch mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.