Method for forming porous material in microcavity or micropassage by mechanicochemical polishing
US8562934B2 · kind B2 · utility
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2References
11Claims
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Key dates
| Filing date | Mar 30, 2009 |
| Grant date | Oct 22, 2013 |
| Priority date | — |
| Expiry date | Mar 21, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A surface of a substrate comprising microcavities leading out of the substrate is placed in contact with an aqueous solution comprising a plurality of suspended particles and a fabric. Perpendicular pressure is applied the expanse of the substrate between the fabric and the surface of the substrate, and relative movement of the fabric and the surface is applied to the expanse of the substrate. At least one particle is thus fed into each microcavity, therein forming a porous material that is a catalyst material for nanothread or nanotube growth.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.