Patent · US Active

Method and device for producing stoichiometry gradients and layer systems

US8563084B2 · kind B2 · utility

1Cited by

3References

9Claims

0Family size

Assignee

VON ARDENNE Anlagentechnik GmbH · DE

Inventors

Harald Gross · Neuschönborn, DE
Carsten Deus · Dresden, DE

Key dates

Filing date	Aug 24, 2010
Grant date	Oct 22, 2013
Priority date	—
Expiry date	Jan 13, 2032

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/548
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A process and a device for coating substrates with a stoichiometric gradient in an in-line coating system include at least two evaporation devices, each with an evaporator tube. The evaporator tubes are implemented so as to be tiltable independently of one another, whereby the transition area of the two vapor lobes can be adapted to the requirements of the gradient profile. Furthermore, the spacing of the evaporator tubes from the substrate and each other can be set.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.