Patent · US Active

Methods for producing photosensitive microparticles

US8563213B2 · kind B2 · utility

11Cited by
84References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 8, 2010
Grant dateOct 22, 2013
Priority date
Expiry dateFeb 25, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/105
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Described are various methods of producing non-aqueous dispersions of photosensitive polymeric microparticles, comprising: (a) preparing one or more aqueous dispersions of a polymerizable component, at least one of which contains a photosensitive material and, wherein the polymerizable components comprise at least one hydrophilic functional group and/or at least one hydrophobic functional group; (b) subjecting the dispersion of (a) to conditions sufficient to form microparticles; (c) at least partially polymerizing the polymerizable component; (d) combining the dispersion with an organic continuous phase comprising an organic solvent; (e) removing water from the dispersion such that the final water content of the non-aqueous dispersion is less than 30 percent by weight; wherein e) is performed before or after d); and (f) reacting any acid functional groups on the surface of the microparticles with a reactive material having at least one epoxy functional group, at least one thiocarbonylthio functional group, at least one alkoxyamine functional group, or at least one halide functional group.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.