Patent · US Active

Process for production of precursor compound for radioactive halogen-labeled organic compound

US8563771B2 · kind B2 · utility

4Cited by
3References
9Claims
0Family size

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Key dates

Filing dateDec 17, 2007
Grant dateOct 22, 2013
Priority date
Expiry dateOct 19, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P20/55
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

A process is provided for producing a labeled precursor which is useful for production of a radioactive fluorine-labeled amino acid compound. In the reaction step for introducing a leaving group to a mixture of syn-form and anti-form of FACBC, a base is allowed to present in the reaction system to produce a syn-leaving group adduct, which is unreactive with the base and is highly stable, and an anti-leaving group adduct which can react with the base to form a water-soluble compound. By employing a purification method utilizing such a difference in solubility, the syn-leaving group adduct can be separated selectively. The base may be a linear- or branched-chain primary to tertiary alkylamine having 1 to 10 carbon atoms, a nitrogen-containing heterocyclic compound with 2 to 20 carbon atoms, and a nitrogen-containing hetero aromatic compound with 2 to 20 carbon atoms.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.