Magnetic field sensor
US8564287B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 3, 2011 |
| Grant date | Oct 22, 2013 |
| Priority date | — |
| Expiry date | Dec 23, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R33/096
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An MR sensor arrangement is integrated with an IC. A metal layer of the IC structure (e.g. CMOS) is patterned to define at least first and second contact regions. Metal connecting plugs are provided below the first and second contact regions of the metal layer for making contact to terminals of the integrated circuit. A magnetoresistive material layer is above the metal layer and separated by a dielectric layer. Second metal connecting plugs extend up from the metal layer to an MR sensor layer. The sensor layer is thus formed over the top of the layers of the IC structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.