Patent · US Active

Pump for a high-pressure cleaning device

US8568109B2 · kind B2 · utility

1Cited by
14References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 21, 2012
Grant dateOct 29, 2013
Priority date
Expiry dateMar 21, 2032

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF04B1/143
  • WIPO fieldEngines, pumps, turbines
  • WIPO sectorMechanical engineering

Abstract

A pump for a high-pressure cleaning device for delivering cleaning fluid is provided. The pump has at least one pump chamber, into which at least one piston plunges, and which is connected to a suction line via at least one inlet valve and to a pressure line via at least one outlet valve. A bypass line leads from the pressure line to the suction line. An overflow valve is arranged in the bypass line. The valve body of the overflow valve is connected to a control piston which is displaceably held in a control chamber with the interposition of a sealing element and moves the valve body into a closed or an open position as a function of the flow rate of the cleaning fluid in the pressure line. A sliding element is arranged in the control chamber and abuts sealingly on the wall of the control chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.