Tip type probe manufacturing method, tip type probe and tip type probe manufacturing apparatus
US8568598B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 18, 2009 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Jan 5, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49043
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A manufacturing method of a tip type probe includes the steps of: forming on a substrate an etching mask of a shape similar to a shape of a top surface of a truncated pyramid; forming the truncated pyramid by subjecting the substrate to isotropic etching using the etching mask as a mask member; stopping the isotropic etching when an area of the top surface reaches an area capable of generating near-field light; and forming a metal film on at least some of the side surfaces of the truncated pyramid by allowing film forming particles to enter into a space between the etching mask and the side surfaces and adhere onto the truncated pyramid. The directivity of the film forming particles is controlled so that the metal film has a thickness that is reduced gradually from a bottom of the truncated pyramid toward the top surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.