Method of manufacturing high density CIS thin film for solar cell and method of manufacturing thin film solar cell using the same
US8569102B2 · kind B2 · utility
3Cited by
3References
12Claims
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Key dates
| Filing date | Jul 19, 2011 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Jul 19, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Disclosed are a high density CIS thin film and a method of manufacturing the same, which includes coating CIS nanopowders, CIGS nanopowders or CZTS nanopowders on a substrate by non-vacuum coating, followed by heat treatment with cavities between the nanopowders filled with filling elements such as copper, indium, gallium, zinc, tin, and the like. The high density CIS thin film is applied to a photo-absorption layer of a thin film solar cell, thereby providing a highly efficient thin film solar cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.