Electronic arrangements for passivated silicon nanowires
US8569741B2 · kind B2 · utility
15Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2011 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Mar 6, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/762
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods for fabricating passivated silicon nanowires and an electronic arrangement thus obtained are described. Such arrangements may comprise a metal-oxide-semiconductor (MOS) structure such that the arrangements may be utilized for MOS field-effect transistors (MOSFETs) or opto-electronic switches.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.