Electrophoretic display device and method of fabrication thereof
US8570640B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2011 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Oct 28, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1681
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed herein is a method of fabricating an electrophoretic display device for reducing the fabrication cost and simplifying the fabrication process, and the method may include providing a substrate comprising a display region arranged with a plurality of pixels and a non-display region; forming a thin-film transistor on a first substrate; forming a passivation layer on the substrate formed with the thin-film transistor; forming a pixel electrode in the display region on the passivation layer and forming a partition wall in the non-display region; filling an electrophoretic material in a pixel inside the partition wall on the passivation layer; applying a sealing material to an upper portion of the electrophoretic material to form a sealing layer; depositing a transparent conductive material on the sealing layer to form a common electrode; and adhering the protection layer to an upper portion of the common electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.