Patent · US Active

Residue concentration measurement technology

US8573034B2 · kind B2 · utility

16Cited by
9References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 10, 2011
Grant dateNov 5, 2013
Priority date
Expiry dateJan 18, 2032

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2001/4027
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and apparatus for measuring dissolved residue concentrations and particulate residue particle concentrations and size distribution in liquids, particularly colloidal suspensions. The method involves separating dissolved and particulate residues in liquids for subsequent analysis of the residue species. The method includes the steps of forming an aerosol from the liquid sample to be analyzed, evaporating the droplets in the aerosol to dryness, detecting and sizing the particles, and determining the liquid volumetric inspection rate. An apparatus for separating dissolved and particulate residues in liquids for determination of the concentrations of the two residue species as well as the size distribution of the particulate species is also disclosed. The apparatus includes a droplet former, a dryer communicatively connected to the droplet former, and a detector communicatively connected to the evaporator for detecting and sizing particles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.