Arrangement for reflection of heat radiation, process of making same and uses of same

US8573194B2 · kind B2 · utility

Assignee

• Schott AG · DE

Inventors

• Christian Henn · Bad Kreuznach, DE
• Wolfgang Schmidbauer · Mainz, DE
• Torsten Gabelmann · Wiesbaden, DE

Key dates

• Filing date: Jun 29, 2009
• Grant date: Nov 5, 2013
• Expiry date: Jul 30, 2031

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C17/3686
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

The heat reflecting arrangement with an improved high heat resistance, e.g. 100 hours at 500° C., includes a substrate, a heat reflecting layer (A) on at least one side of the substrate, which contains indium tin oxide (ITO), and a barrier layer (B) that covers the heat reflecting layer (A), which contains a metal oxide and/or a metal nitride. A fireplace or baking oven with a viewing window having this layer system with the heat reflecting layer is also described. In addition a process for providing the heat reflecting arrangement is described.