Improvements for rapid prototyping apparatus
US8573958B2 · kind B2 · utility
2Cited by
5References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2009 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | May 10, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB33Y30/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A stereolithography apparatus and an exposure system for a stereolithography apparatus, wherein light emitting diodes are used as light sources. The invention relates to aligning light from the light emitting diode and to the exchange and control of the light emitting diodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.