Method of forming single-layer photonic crystal structure
US8574415B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2011 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | Jan 3, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D13/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a single-layer photonic crystal structure. The method includes depositing electrophoretic suspension, working electrode and lower electrode in a container, wherein the working electrode and the lower electrode are formed at upper and lower parts of the container, respectively, and spaced apart at an distance; and applying an electric voltage to the working electrode and the lower electrode to form an electric field, such that particles in the electrophoretic suspension form a single-layer photonic crystal structure on the working electrode under interactive actions of the electric field and a gravity field by an electrophoresis self-assembly technique. Therefore, the single-layer photonic crystal structure has a low cost, and good quality and recurring property.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.