Photomask including super lens and manufacturing method thereof
US8574792B2 · kind B2 · utility
2Cited by
1References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 2011 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | Dec 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.