Nanoimprint resist
US8574822B2 · kind B2 · utility
6Cited by
2References
6Claims
0Family size
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Key dates
| Filing date | May 24, 2012 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | May 24, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31855
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether, a methylmethacrylate, a diluent solvent, and a photo initiator. The hyperbranched polyurethane oligomer can be polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid. The hyperbranched polyurethane oligomer can also be polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.