Lift-off structure for substrate of a photoelectric device and the method thereof
US8575004B2 · kind B2 · utility
3Cited by
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7Claims
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Key dates
| Filing date | Oct 14, 2011 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | Jan 19, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
Abstract
The present invention related to a lift-off structure adapted to a substrate having a photoelectric device, the structure comprising: a buffer layer, forming on the substrate; an upper sacrificial layer, forming on the buffer layer; an etch stop layer, forming on the upper sacrificial layer, and the photoelectric device structure forming on the etch stop layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.