Method of forming a fine pattern, display substrate, and method of manufacturing the same using the method of forming a fine pattern
US8575031B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2012 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | Mar 24, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/3025
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is provided for forming a fine pattern. In the method, a first fine pattern and a first metal pattern are formed by respectively patterning a first fine pattern layer on a base substrate and a first metal layer on the first fine pattern layer. A second fine pattern layer and a second metal layer are sequentially formed over the first fine pattern and the first metal pattern. The second metal layer is patterned, so that a second metal pattern between adjacent portions of the first fine pattern. The second fine pattern layer is patterned using the second metal pattern as a mask, so that a second fine pattern is formed between adjacent portions of the first fine pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.