Ion source apparatus and methods of using the same
US8575565B2 · kind B2 · utility
0Cited by
53References
23Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 10, 2011 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | Jan 25, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/143
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.