Patent · US Active

Apparatus for forming a nanoscale semiconductor structure on a substrate by applying a carrier fluid

US8575591B2 · kind B2 · utility

1Cited by

16References

8Claims

0Family size

Assignee

Nokia · FI

Inventors

Petri Korpi · Kangasala, FI
Risto Ronkka · Tampere, FI

Key dates

Filing date	Mar 31, 2008
Grant date	Nov 5, 2013
Priority date	—
Expiry date	Jan 10, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH10K2102/331
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

An apparatus applies a carrier fluid to a semiconductor substrate. The carrier fluid carries nanoparticles. The positions of a plurality of particles in the carrier fluid are manipulated by applying an electric field, removing the carrier fluid from the substrate so as to leave the nanoparticles on the substrate, and sintering the nanoparticles to form a region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.