System, method and apparatus for generating plasma
US8575843B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2009 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | Dec 15, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/36
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generating system, related method and device are disclosed. The plasma generation system includes a plasma generation device, a source of ionizable gas and a driver network. The plasma generation device includes a housing, an electrode, and a resonant circuit. The housing includes a passage defined therein and directs a flow of ionizable gas therethrough. The electrode is coupled to the ionizable gas flowing through the passage of the housing. The resonant circuit includes a capacitor and an inductor connected together in series. The resonant circuit has a resonance frequency and is coupled to the electrode. The resonant circuit receives an AC signal. The driver network provides the AC signal such that the AC signal has a frequency and excites the ionizable gas flowing through the passage of the housing to a plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.