Patent · US Active

Method of manufacturing thermal assisted magnetic write head

US8578593B2 · kind B2 · utility

4Cited by
5References
7Claims
0Family size

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Key dates

Filing dateOct 12, 2010
Grant dateNov 12, 2013
Priority date
Expiry dateMar 16, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49052
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A method of manufacturing a thermally-assisted magnetic write head is provided. The method includes steps of: forming a laminate structure including the waveguide; the plasmon generator, and the magnetic pole in order; performing a first polishing process to planarize an end surface of the laminate structure; performing a first etching process to remove impurity attached on the end surface of the laminate structure, and to allow the plasmon generator to be recessed from the waveguide and the magnetic pole, thereby forming a recessed region on the end surface of the laminate structure; forming a protection layer on the end surface of the laminate structure such that at least the recessed region is filled; and performing a second polishing process on the end surface of the laminate structure formed with the protection layer until the plasmon generator is exposed, thereby completing the air bearing surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.