Apparatus for agitating and evacuating byproduct dust from a semiconductor processing chamber
US8580044B2 · kind B2 · utility
1Cited by
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20Claims
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Key dates
| Filing date | Aug 13, 2010 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Aug 25, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4407
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A system and method for semiconductor processing chamber includes a housing that can cover an annular gap of a pedestal well of the semiconductor processing chamber. A cleaning nozzle is removably coupled to a compressed dry air (CDA) supply. The cleaning nozzle can inject the CDA into the pedestal well while the housing can contain a byproduct dust agitated by the injected CDA. The byproduct dust is evacuated by at least one vacuum port that is removably coupled to a vacuum source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.