Patent · US Active

Laser-assisted nanomaterial deposition, nanomanufacturing, in situ monitoring and associated apparatus

US8580130B2 · kind B2 · utility

3Cited by
1References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 16, 2008
Grant dateNov 12, 2013
Priority date
Expiry dateApr 19, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/1158
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.