Patent · US Active

Method for thin layer deposition

US8580355B2 · kind B2 · utility

16Cited by

1References

21Claims

0Family size

Assignee

SAINT-GOBAIN GLASS FRANCE · FR

Inventors

Anne Durandeau · Paris, FR
Andriy Kharchenko · Palaiseau, FR
Nicolas Nadaud · Paris, FR

Key dates

Filing date	Apr 10, 2009
Grant date	Nov 12, 2013
Priority date	—
Expiry date	Dec 15, 2029

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2218/328
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

The subject of the invention is a process for obtaining a material comprising a substrate and at least one at least partially crystalline titanium-oxide-based thin film deposited on a first side of said substrate, said process comprising the following steps:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.