Patent · US Active

Process for preparing stable photoresist compositions

US8580915B2 · kind B2 · utility

0Cited by

4References

1Claims

0Family size

Assignee

E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

William R. Russell · Miamisburg, US
John Anthony Schultz · Kettering, US

Key dates

Filing date	May 23, 2012
Grant date	Nov 12, 2013
Priority date	—
Expiry date	May 23, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0392
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

A micro electromechanical system having incorporated therein a composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.