Power trench MOSFET rectifier
US8581336B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Jun 4, 2010 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Sep 16, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/126
Abstract
A trench MOSFET rectifier includes oxide layers having different thicknesses formed in different regions of the devices. The rectifying device also includes a source region of first conductivity type at a surface of each mesa region and a body region of a second conductivity type beneath each source region. The rectifying device also includes a dielectric layer lining the bottom and sidewall surfaces of the trenches, the portion of the dielectric layer on the bottom surface being thicker than the portion on the sidewall surface. A doped region underlies each of the first plurality of trenches. A polycrystalline silicon region filling each of the first plurality of trenches to form a gate region in each trench. A conductive material fills a plurality of contact trenches and forms ohmic contacts with the source region, body region, and gate region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.