Patent · US Active

Apparatus for producing plasma

US8581495B2 · kind B2 · utility

0Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 30, 2009
Grant dateNov 12, 2013
Priority date
Expiry dateAug 8, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H2245/36
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

An apparatus for producing plasma, includes a container provided with at least one discharge electrode and a power supply unit that has at least one coupling electrode that can be capacitively coupled to the discharge electrode. The power supply unit is adapted to be removable from the container. The at least one coupling electrode is disposed beneath an insulating layer. In this way, the user can not come into direct contact with a coupling electrode after removing the power supply unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.