Apparatus for producing plasma
US8581495B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2009 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Aug 8, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/36
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for producing plasma, includes a container provided with at least one discharge electrode and a power supply unit that has at least one coupling electrode that can be capacitively coupled to the discharge electrode. The power supply unit is adapted to be removable from the container. The at least one coupling electrode is disposed beneath an insulating layer. In this way, the user can not come into direct contact with a coupling electrode after removing the power supply unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.