Patent · US Active

Microplasma current switch

US8587197B2 · kind B2 · utility

0Cited by
1References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 26, 2008
Grant dateNov 19, 2013
Priority date
Expiry dateFeb 9, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K59/10
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The present invention relates to a microplasma current switch enabling to increase the amount of electric current passing through the microplasma current switch by adjusting the areas of electrodes exposed to plasmas. The present invention includes a plasma discharge space; a plasma generating means installed within the plasma discharge space; an exposed cathode electrode installed within the plasma discharge space; and an exposed anode electrode installed within the plasma discharge space apart from the exposed cathode electrode, wherein the exposed anode electrode is connected electrically to the exposed cathode electrode by generating a plasma, and the exposed area of the exposed anode electrode to the plasma is smaller than that of the exposed cathode electrode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.