EUV collector system with enhanced EUV radiation collection
US8587768B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2011 |
| Grant date | Nov 19, 2013 |
| Priority date | — |
| Expiry date | Jan 6, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70175
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.