Apparatus for modifying electron beam aspect ratio for X-ray generation
US8588372B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 16, 2009 |
| Grant date | Nov 19, 2013 |
| Priority date | — |
| Expiry date | May 6, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/068
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for modifying an aspect ratio of an electron beam to form a focal spot having a desired size and aspect ratio on a target anode is disclosed. The apparatus includes an emitter element configured to generate an electron beam having a first aspect ratio shape and an extraction electrode positioned adjacent to the emitter element to extract the electron beam out therefrom, the extraction electrode including an opening therethrough. The apparatus also includes at least one shaping electrode positioned to receive the electron beam after passing through the extraction electrode, the shaping electrode defining a non-circular aperture therein and being configured to provide at least one of shaping and focusing of the electron beam to have a second aspect ratio shape different from the first aspect ratio shape so as to form a focal spot having a desired size and aspect ratio on a target anode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.