Patent · US Active

On-machine measurement method and measurement apparatus

US8589103B2 · kind B2 · utility

3Cited by
0References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 12, 2010
Grant dateNov 19, 2013
Priority date
Expiry dateMar 4, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B21/045
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A reference mirror 21 is disposed on a table 2, a first laser displacement sensor L1 for measuring a machined surface of a workpiece W and a second laser displacement sensor L2 for measuring a reference surface of the reference mirror 21 are disposed to a tool holder 3. A measurement motion applying section 24 causes the table 2 and the tool holder 3 to relatively move in a sinusoidal trajectory, and a sensitivity calculating section 28 calculates sensitivity of the first laser displacement sensor L1 based on machined-surface displacement data and reference-surface displacement data which are measured during the relative movement. Subsequently, an actual shape data calculating section 29 corrects the machined-surface displacement data based on the calculated sensitivity, and calculates actual shape data of the machined surface by taking the difference between the corrected machined-surface displacement data and the reference-surface displacement data.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.