Patterning of and contacting magnetic layers

US8590139B2 · kind B2 · utility

Assignees

• IMEC · BE
• Katholieke Universiteit Leuven, KU LEUVEN R&D · BE

Inventors

• Maria Op de Beeck · Kasai, JP
• Liesbet Lagae · Leuven, BE
• Sven Cornelissen · Leuven, BE

Key dates

• Filing date: May 18, 2010
• Grant date: Nov 26, 2013
• Expiry date: May 18, 2030

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24802

Abstract

A method according to embodiments of the present invention comprises providing a magnetic stack comprising a magnetic layer sub-stack comprising magnetic layers and a bottom conductive electrode and a top conductive electrode electrically connecting the magnetic layer sub-stack at opposite sides thereof; providing a sacrificial pillar on top of the magnetic stack, the sacrificial pillar having an undercut with respect to an overlying second sacrificial material and a sloped foot with increasing cross-sectional dimension towards the magnetic stack, using the sacrificial pillar for patterning the magnetic stack, depositing an insulating layer around the sacrificial pillar, selectively removing the sacrificial pillar, thus creating a contact hole towards the patterned magnetic stack, and filling the contact hole with electrically conductive material.