Opthalmic apparatuses, systems and methods
US8591032B2 · kind B2 · utility
20Cited by
12References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2011 |
| Grant date | Nov 26, 2013 |
| Priority date | — |
| Expiry date | May 12, 2031 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/1015
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Ophthalmic apparatuses, systems and methods are disclosed. One embodiment is an ophthalmic scanning apparatus including a laser operable to emit a laser beam, a scanning mirror operable to scan the laser beam over at least a +/−15 degree scan, and a lens system operable to receive the laser beam from the scanning mirror and direct the laser beam to a spot on an image plane. The spot has a root mean square radius of less than about 3.8 microns over the +/−15 degree scan. Further embodiments include methods of modeling and determining corrective prescriptions for patient's eyes. Additional embodiments are described herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.