Multilayer photonic structures
US8593728B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 13, 2010 |
| Grant date | Nov 26, 2013 |
| Priority date | — |
| Expiry date | Jan 9, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/285
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multilayer photonic structure may include a plurality of coating layers of high index dielectric material of index of refraction nH and a plurality of coating layers of low index dielectric material of index of refraction nL alternately arranged with a first coating layer and a last coating layer of the multi-layer photonic structure comprise low index material. An index-thickness of each coating layer of the multilayer photonic structure is different than every other coating layer of the multilayer photonic structure. The multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.