Methods of forming a photo mask
US8595657B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2012 |
| Grant date | Nov 26, 2013 |
| Priority date | — |
| Expiry date | Apr 13, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K5/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Methods of fabricating a photo mask are provided. The method includes collecting sample data, setting a preliminary mask layout, performing an optical proximity correction using the sample data and a preliminary mask layout to obtain an optimized preliminary mask layout, verifying the optimized preliminary mask layout to obtain a final mask layout, and fabricating the photo mask using the final mask layout. Verification of the optimized preliminary mask layout includes operating a verification simulator using the sample data and the optimized preliminary mask layout as input data to obtain verification image data. The verification image data includes a plurality of contours of a pattern at different vertical positions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.