Patent · US Active

Application controller

US8596217B2 · kind B2 · utility

3Cited by

4References

12Claims

0Family size

Assignee

LEICA GEOSYSTEMS AG · CH

Inventors

Peter Kipfer · Erbach, DE
Christian Betschon · Heiden, CH
Bernd Walser · Altstätten, CH

Key dates

Filing date	Feb 6, 2007
Grant date	Dec 3, 2013
Priority date	—
Expiry date	Aug 11, 2029

Classification

Technology area (CPC A)Human Necessities
CPC primaryA63C2203/18
WIPO fieldControl
WIPO sectorInstruments

Abstract

An application controller for an application unit, for marking substances comprises a radiation sensor, by means of which the relative position of the application unit relative to a reference plane may be determined. The relative position of the application unit can be determined by means for recording the orientation of the application unit controller relative to the reference plane from the association of position with orientation information, such that control instructions, in particular for positional correction may be generated by the application unit controller. The position of the application unit can be adjusted by an actuator device according to the control instructions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.