Sensor of an apparatus for determining and/or monitoring a process variable
US8597791B2 · kind B2 · utility
1Cited by
8References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 10, 2008 |
| Grant date | Dec 3, 2013 |
| Priority date | — |
| Expiry date | Nov 29, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sensor of an apparatus for determining and/or monitoring at least one process variable. The sensor includes: at least one substrate, which is composed of a substrate material; at least one sensitive layer, which is applied on the substrate and which produces at least one measured variable dependent on the process variable and/or on a change of the process variable; and at least one passivating layer, which is applied on the sensitive layer. The invention provides that the passivating layer consists at least partially of the substrate material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.