Active device array substrate

US8597968B2 · kind B2 · utility

Assignee

• Au Optronics Corporation · TW

Inventors

• Yu-Cheng Chen · Jiaocheng District, CN
• Chen-Yueh Li · Baoshan, TW
• Ching-Sang Chuang · Sunnyvale, US
• Ching-Chieh Shih · Baoshan, TW
• An-Thung Cho · Wanrong, TW

Key dates

• Filing date: Jan 19, 2012
• Grant date: Dec 3, 2013
• Expiry date: Jan 19, 2032

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D86/60

Abstract

An active device array substrate is provided. First, a substrate having a display area and a sensing area is provided. Then, a first patterned conductor layer is disposed on the display area of the substrate. A gate insulator is disposed on the substrate. A patterned semiconductor layer, a second patterned conductor layer and a patterned photosensitive dielectric layer are disposed on the gate insulator, wherein the second patterned conductor layer includes a source electrode, a drain electrode and a lower electrode, the patterned photosensitive dielectric layer covering the second patterned conductor layer includes an interface protection layer disposed on the source electrode and the drain electrode and a photo-sensing layer disposed on the lower electrode. A passivation layer is then disposed on the substrate. After that, a third patterned conductor layer including a pixel electrode and an upper electrode is disposed on the passivation layer.