Forming a bridging feature using chromeless phase-shift lithography
US8603706B2 · kind B2 · utility
0Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2011 |
| Grant date | Dec 10, 2013 |
| Priority date | — |
| Expiry date | Mar 8, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
First and second anchor features are formed on a substrate via a chromeless photolithography process. An elongated bridging feature is formed between the anchor features on the substrate via the chromeless photolithography process. A distance between the anchor features is sufficient to minimize lateral displacement at a center portion of the bridging feature without significant reduction in mechanical stability of the bridging feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.