Patent · US Active

Radiation-sensitive resin composition, polymer and compound

US8603726B2 · kind B2 · utility

1Cited by

2References

11Claims

0Family size

Assignee

JSR CORPORATION · JP

Inventors

Kazuo Nakahara · Tokyo, JP
Mitsuo Sato · Shibata, JP
Yusuke Asano · Tokyo, JP

Key dates

Filing date	Sep 23, 2011
Grant date	Dec 10, 2013
Priority date	—
Expiry date	Dec 13, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08F220/303
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.