Patent · US Active

In-line metrology system

US8603839B2 · kind B2 · utility

1Cited by

32References

24Claims

0Family size

Assignee

First Solar, Inc. · US

Inventors

Arnold Allenic · San Jose, US
Stephan Paul George, II · Perrysburg, US
Sreenivas Jayaraman · Maumee, US
Oleh Karpenko · San Jose, US
Chong Lim · Perrysburg, US

Key dates

Filing date	Jul 25, 2011
Grant date	Dec 10, 2013
Priority date	—
Expiry date	Dec 5, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.